By Karen K. Gleason
The strategy of CVD (chemical vapor deposition) is a flexible strategy to fabricate top quality skinny movies and based surfaces within the nanometer regime from the vapor part. Already familiar for the deposition of inorganic fabrics within the semiconductor undefined, CVD has develop into the strategy of selection in lots of purposes to technique polymers in addition. This hugely scalable strategy allows synthesizing high-purity, defect-free motion pictures and for systematically tuning their chemical, mechanical and actual houses. additionally, vapor part processing is important for the deposition of insoluble fabrics together with fluoropolymers, electrically conductive polymers, and hugely crosslinked natural networks. moreover, CVD permits the coating of substrates which might in a different way dissolve or swell upon publicity to solvents.
The scope of the e-book encompasses CVD polymerization methods which at once translate the chemical mechanisms of conventional polymer synthesis and natural synthesis in homogeneous drinks into heterogeneous strategies for the amendment of strong surfaces. The ebook is dependent into 4 components, complemented by way of an introductory evaluate of the various technique ideas for CVD of polymeric fabrics. the 1st half at the basics of CVD polymers is via a close assurance of the fabrics chemistry of CVD polymers, together with the most synthesis mechanisms and the consequent periods of fabrics. The 3rd half specializes in the functions of those fabrics akin to membrane amendment and equipment fabrication. the ultimate half discusses the potential of scale-up and commercialization of CVD polymers
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Additional info for CVD Polymers : fabrication of organic surfaces and devices
A) Reprinted with permission from Ref. . Copyright 2002, American Chemical Society. (b,c) Reprinted with permission from Ref. . Copyright 2006, American Chemical Society. (d) Reprinted with permission from Ref. . ) the initiator, ﬁlament temperatures higher than 530 ∘ C are needed to obtain deposition, and even then deposition is slow at around 10 nm min−1 . By adding PFOSF, much higher growth rates can be obtained (>100 nm min−1 ) and at lower ﬁlament temperatures (<500 ∘ C). 3a, an Arrhenius plot of deposition rate with ﬁlament temperature yields two separate operating regimes.
Gleason. © 2015 Wiley-VCH Verlag GmbH & Co. KGaA. Published 2015 by Wiley-VCH Verlag GmbH & Co. KGaA. 15 2 Growth Mechanism, Kinetics, and Molecular Weight Kenneth K. S. 1 Introduction In the chemical vapor deposition (CVD) of polymers, as with any chemical synthesis or process, a detailed understanding of the fundamental phenomena underlying the overall procedure is highly beneﬁcial toward enabling eﬀective integration of the deposited materials in desired applications. The ability to control the factors inﬂuencing the polymer growth process is important in deriving the requisite polymer chemical makeup and physical morphology.
Here, we will discuss relevant kinetic and parametric studies for diﬀerent classes of polymers to understand the underlying factors and mechanisms dictating polymer growth behavior in iCVD. The discussions of these studies are arranged in more or less a chronological order to further understand the rationale of iCVD’s process development. 1 Fluorocarbon Polymers One of the very ﬁrst polymers synthesized by iCVD is polytetraﬂuoroethylene (PTFE), more commonly known by its DuPont trademark as Teﬂon.